GÜNAM central clean room facility consists of four regions with a total lab area of 150 m2. C-Si and Si based thin film production tools are located in the main hall of the facility. There are separate rooms for wet chemical processing and optical lithography. There is also a room for testing and characterization.
In the lithography room, complete lithography process equipments which include a mask aligner, spin coater, drying oven are available. In the wet process room, a wet bench for pre and after cleaning of samples, a chemical safety cabinet for chemical processes, a texturing bath for solar cell texture and all necessary chemicals and equipments for wet processes are available.